EUV lithography Technology is Progressing but Timeline for 16 Nanomater Node is Still at Risk

Ad Support : Nano Technology   Netbook    Technology News    Computer Software A 104 watt EUV light source was produced which would enable 60 wafers per hour. However pressure remains for a EUV source capable of 250-watts at intermediate focus. Indeed it is possible that for the NXE3300 production machines, due in 2012, the LPP (laser produced plasma) …

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Robotic Car: Darpa Urban Challenge starts Nov 3, 2007

The DARPA Urban challenge for robotic cars starts Nov 3, 2007 in Victorville, California The National Qualification Event will take place at the same location, October 26-31, 2007 with 35 competitors. Brian WangBrian Wang is a Futurist Thought Leader and a popular Science blogger with 1 million readers per month. His blog Nextbigfuture.com is ranked …

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