EUV lithography Technology is Progressing but Timeline for 16 Nanomater Node is Still at Risk
Ad Support : Nano Technology Netbook Technology News Computer Software A 104 watt EUV light source was produced which would enable 60 wafers per hour. However pressure remains for a EUV source capable of 250-watts at intermediate focus. Indeed it is possible that for the NXE3300 production machines, due in 2012, the LPP (laser produced plasma) …