HP licensing nanoimprint lithography

HP today announced it is licensing nanoimprint lithography (NIL) technology that could enable the fabrication of semiconductor chips significantly more powerful than those available today. NIL allows the stamping out patterns of wires less than 50 atoms (5 nanometers) wide on a substrate versus current 45 nanomater lithography.

About The Author

Add comment

E-mail is already registered on the site. Please use the Login form or enter another.

You entered an incorrect username or password

Sorry, you must be logged in to post a comment.