EEtimes reports the University of California at Berkeley provided an update on a technology called plasmonic nano-lithography–based on a flying lens. U.C. Berkeley has devised a tool with four and six lenses. The goal is to devise a tool with 10,000 lenses and a throughput of 60 wafers an hour. In theory, it will make devices at the 22-nm half-pitch node.
Patterning by scanning in an extreme fashion, plasmonic nanolithography is a maskless approach utilizing a flying head carrying an optical stylus to write onto the recording surface at nanometer scales. It has the potential to reach a resolution below 10 nm and orders higher throughput than other maskless lithography methods.
The two key components in this work are the plasmonic lens and the flying plasmonic head. Plasmonic lens is micrometer scale structure that utilizes the collective oscillation of electrons at the metal dielectric interface, so called surface plasmons (SPP), to focus the energy of incident light into the nano-scale. The nanometers size optical stylus created by plasmonic lens is powerful enough to enable pattern writing in outstanding speed of tens of miles per hour.
The flying head
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