MIT Work to make e-beam lithography mass-production technique at 9 nanometers
Researchers at MIT’s Research Laboratory of Electronics (RLE) present a way to get the resolution of high-speed e-beam lithography down to just nine nanometers. Combined with other emerging technologies, it could point the way toward making e-beam lithography practical as a mass-production technique. The main difference between e-beam lithography and photolithography is the exposure phase. …