Quad patterning a possibility at 10nm says Taiwan Semiconductor and Intel
EETimes – Quad patterning may be needed for 10-nm process technology if extreme ultraviolet (EUV) lithography is not ready in 2015 or so when Taiwan Semiconductor Manufacturing Co. expects to start early production of the technology. He also said we can see down to 5 nm easily in the next five years. Jack Sun, chief …