Ultraviolet Metalenses Mass Produced. Will Enable Future AI Chips

March 28, 2024March 26, 2024 by Brian Wang

Extreme Ultraviolet lithography for computer chips have been critical to letting us efficiently get better than 14 nanometer computer chips. Deep ultraviolet lithography were used for 14 nanometer feature sizes. China chip companies do not have access to EUV lithography equipment and have pushed deep ultraviolet lithography to 7 nanometer feature sizes. Metalenses are 10,000 …

Metalenses Sorts Color Without Color Filters

December 21, 2021 by Brian Wang

Polarization-insensitive metasurface lenses (metalenses) sort primary colors on high-density pixels without the use of color filters. The metalenses simultaneously act as pixel-scale color splitters and lenses and are compatible with complementary metal–oxide-semiconductor sensor technology. An image sensor with such metalenses significantly enhances the detected light power, while affording high image quality, incident angle tolerance, and …