Toshiba claims to ‘validate’ nano-imprint litho

Molecular Imprints Inc. (MII) claims that Toshiba Corp. has ”validated” the use of its nano-imprint lithography technology in developing 22-nm CMOS devices

Nanoimprint seems to be a viable plan B in case EUV stumbles.

It’s unclear if Toshiba will put nano-imprint tools into its production fabs at 22-nm and beyond. At this node, Toshiba is also exploring other lithography technologies, such as 193-nm immersion and extreme ultraviolet (EUV).

”Toshiba leveraged MII’s Imprio 250 system to pattern 18-nm isolated features and 24-nm dense features with