Cost Effective Extreme Ultraviolet Lithography to at least 11 nanometers
ASML Holding NV (ASML) presents today at the 2008 International Symposium on Extreme Ultraviolet Lithography (EUV) on recent achievements in its EUV lithography program and unveils a production system roadmap that supports cost-effective chip manufacturing to at least 11 nanometers (nm). This would enable the ITRS roadmap to stay on track through 2022. The ASML …